发明名称 Flash memory cell and method of making the same
摘要 A highly efficient split-gate type flash memory cell with an insulation spacer of an ONO or ON structure formed at the side walls of the floating gate according to the present invention can improve program and erasure capabilities of the cell by preventing reduction of the coupling ratio and leakage of electrons through the floating gate and the control gate.
申请公布号 US5702965(A) 申请公布日期 1997.12.30
申请号 US19960666013 申请日期 1996.06.19
申请人 HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. 发明人 KIM, JEOUNG WOO
分类号 H01L27/115;H01L21/336;H01L29/423;(IPC1-7):H01L21/265;H01L21/70;H01L27/00;H01L21/02 主分类号 H01L27/115
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