发明名称 |
CONTAMINATING ELEMENT ANALYZING METHOD AND APPARATUS OF THE SAME |
摘要 |
A contaminating-element analyzing method and an apparatus of the same are disclosed. Differential smoothing process is performed for a measured waveform of a fluorescent X-ray obtained from an object to be measured so as to detect a peak of the measured waveform, the object containing a contaminating element. A model function with variables which are initial parameters with respect to each peak of the measured waveform is provided so as to constitute a model waveform. A nonlinear optimizing process is performed using the method of least squares of the model waveform and the measured waveform so as to decide initial parameters of each model function and to obtain discriminated waveforms. A contaminating element is identified corresponding to each of the discriminated waveforms and obtaining an integrated intensity of a discrete waveform of each of the identified contaminating elements. A background intensity is obtained corresponding to a measured waveform of a fluorescent X-ray obtained from a non-contaminating object which does not contain any contaminating element. The background intensity is subtracted from an integrated intensity of a discrete waveform of each contaminating element. |
申请公布号 |
KR0127497(B1) |
申请公布日期 |
1997.12.29 |
申请号 |
KR19930017771 |
申请日期 |
1993.09.06 |
申请人 |
TOSHIBA KK. |
发明人 |
KOMATSU, FUMIO;MIYAZAKI, KUNIHIRO;SHIMAZAKI, AYAKO |
分类号 |
G01N23/223;(IPC1-7):G01N23/225 |
主分类号 |
G01N23/223 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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