| 摘要 |
PURPOSE:To obtain a highly sensitive photosensitive resin composition capable of being well preserved by incorporating N-phenylglycine, its derivative and their compds, into a polyamic ester. CONSTITUTION:A polyamic ester shown by formula I, N-phenylglycine shown by formula II, its derivative and the thiol compds. shown by formula III are used as the essential components. In formula I, R1,...R6 are 3 or 4-valent org. groups, etc., and can be the same or different, (l), (m) and (n) are 0 or 1, (p) is an integer of 1 to 5, 0<x, y<100, 0<z<80, x+y+z=100, and the (x), (y) and (x) are the percentage of each structural unit. Since N-phenylglycine, its derivative, and thiol compds. are incorporated into the polyamic ester, the photochemical radical reaction is easily and efficiently initiated and conducted, and the sensitivity is drastically improved. Besides, the viscosity change is reduced at room temp. by addition of thiol compds. |
