发明名称 Device for the insolation of micrometric and/or submicrometric areas in a photosensitive layer and a method for the creation of patterns in such a layer
摘要 A device for insolating micrometric areas in a photosensitive layer and a method for producing patterns in such a layer. The method is characterized in that the layer is subjected to an atmosphere containing a transparent liquid that does not wet the photosensitive material, in order to produce on this layer a monolayer of micro-droplets (121), the layer of photosensitive material is insolated through the monolayer of micro-droplets (121) in order to selectively print the areas of exposure (122) of the layer, the micro-droplets (121) are removed, and the layer of photosensitive material is developed in order to form said patterns in accordance with the areas of exposure.
申请公布号 US5700627(A) 申请公布日期 1997.12.23
申请号 US19960696716 申请日期 1996.08.14
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE 发明人 IDA, MICHEL;BAPTIST, ROBERT
分类号 G03B7/20;G03F7/20;H01J9/02;H01L21/027;(IPC1-7):G03C5/00 主分类号 G03B7/20
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