发明名称 |
Device for the insolation of micrometric and/or submicrometric areas in a photosensitive layer and a method for the creation of patterns in such a layer |
摘要 |
A device for insolating micrometric areas in a photosensitive layer and a method for producing patterns in such a layer. The method is characterized in that the layer is subjected to an atmosphere containing a transparent liquid that does not wet the photosensitive material, in order to produce on this layer a monolayer of micro-droplets (121), the layer of photosensitive material is insolated through the monolayer of micro-droplets (121) in order to selectively print the areas of exposure (122) of the layer, the micro-droplets (121) are removed, and the layer of photosensitive material is developed in order to form said patterns in accordance with the areas of exposure. |
申请公布号 |
US5700627(A) |
申请公布日期 |
1997.12.23 |
申请号 |
US19960696716 |
申请日期 |
1996.08.14 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE |
发明人 |
IDA, MICHEL;BAPTIST, ROBERT |
分类号 |
G03B7/20;G03F7/20;H01J9/02;H01L21/027;(IPC1-7):G03C5/00 |
主分类号 |
G03B7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|