发明名称 |
Mask for light exposure and process for production of the same |
摘要 |
There is disclosed a mask for light exposure which comprises being provided with a light transparent substrate and a mask pattern formed on the light transparent substrate, the mask pattern comprising a light screening pattern composed of a material which screens the exposure light and transmits the light having the longer wavelength than that of the exposure light and a phase shift pattern formed by engraving a part of the light transparent substrate.
|
申请公布号 |
US5700605(A) |
申请公布日期 |
1997.12.23 |
申请号 |
US19960616306 |
申请日期 |
1996.03.15 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
ITO, SHIN-ICHI;IWAMATSU, TAKAYUKI |
分类号 |
G03F1/08;G03F1/00;G03F1/14;H01L21/027;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|