| 摘要 |
PROBLEM TO BE SOLVED: To lessen the change in resist performance by lapse of time before a heat treatment after exposure by incorporating a specific compd. which generates sulfonic acid into the compsn., thereby imparting high resolving power to the compsn. without deteriorating its sensitivity. SOLUTION: This photosensitive compsn. contains a compd. which is expressed by formula I or formula II and generates sulfonic acid by irradiation with actinic rays or radiations. In the formulas, (n) denotes a natural number from 1 to 3; (m) denotes 2 or 3; A1 denotes (substd.) straight chain, branch or cyclic alkyl group, etc.; X denotes oxygen atom or sulphur atom; A2 denotes (substd.) straight chain, branch or cyclic alkyl group, etc., in the case of n=1; Y1 is the same as A2 in the case of n=1; Y2 denotes straight chain, branch or cyclic alkyl group, arylene group or aralkylene group. R1 , R2 may be the same or different and denote hydrogen atoms, etc., R1 and R2 , R1 and A2 or R1 and Y1 may combine to form a ring. A heteroatom may be incorporated into this ring. |
