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发明名称
METHOD FOR ETCHING NITRIDE COMPOUND SEMICONDUCTOR AND MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要
申请公布号
JPH09330916(A)
申请公布日期
1997.12.22
申请号
JP19960170541
申请日期
1996.06.10
申请人
SONY CORP
发明人
KAWAI HIROHARU
分类号
H01L29/41;H01L21/302;H01L21/3065;H01L21/338;H01L29/20;H01L29/778;H01L29/812;(IPC1-7):H01L21/306
主分类号
H01L29/41
代理机构
代理人
主权项
地址
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