发明名称 METHOD FOR CORRECTING ABERRATION OF OPTICAL SYSTEM AND PROJECTING EXPOSURE DEVICE PROVIDED WITH ABERRATION CORRECTING OPTICAL SYSTEM
摘要 PROBLEM TO BE SOLVED: To quickly and accurately execute fine adjustment for the rotational symmetry aberration of an optical system by changing the surface power of one surface of an aberration correcting optical system arranged in a telecentric optical path on the object side or image side of a J optical system. SOLUTION: The aberration correcting optical system 4 is arranged in a telecentric optical path between a lens surface most close to a projecting optical system 3 and an image surface. The aberration of the optical system is corrected by changing the surface power of one surface of the optical system 4. When it is defined that the synthetic power of a partial lens group in the optical system between an iris arranged in the optical system and the optical system 4 isϕ1 and the synthetic power of the optical system 4 isϕ2, a conditional relation|ϕ1/ϕ2|>80 is satisfied. Consequently rotational symmetry aberration to be finely adjusted can be corrected while suppressing the aberration not to be corrected.
申请公布号 JPH09329742(A) 申请公布日期 1997.12.22
申请号 JP19960170609 申请日期 1996.06.10
申请人 NIKON CORP 发明人 SHIGEMATSU KOJI
分类号 G02B13/22;G03F7/20;H01L21/027;(IPC1-7):G02B13/22 主分类号 G02B13/22
代理机构 代理人
主权项
地址