The invention relates to an agent for removing photoresist and to a method of removing photoresist. Said agent essentially comprises 20 to 50 wt.% of a primary alcoholamine and a solvent which contains 30 to 70 wt.% of an alkyleneglycolalkylether, as well as 70 to 30 wt.% of an organic sulphur-oxide compound, such as dimethylsulphoxide. It has been found that said agent can be used very effectively to strip away photoresist. Said effectiveness continues unabated even after a large number of substrates have been treated with this agent.
