METHOD OF MANUFACTURING PHOTOMASK, METHOD OF MANUFACTURING PHASE-SHIFTING MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

摘要

A photomask manufacturing method includes a step (100) of comparing the design data before a design change with those after the design change, a step (200) of finding areas in which design data are changed from the original design data, a step (300) of preparing new drawing data for the changed-data areas in accordance with the changed data, a step (400) of combining the drawing data of the changed-data areas with the already prepared drawing data of unchanged-data areas, and a step (500) of fabricating a photomask after the design change based on the combined drawing data.