Vapor deposition method and apparatus

摘要

A vapor deposition method and apparatus that performs the method. In the method, a supply of vaporizable material is maintained, in a first zone, in thermal and phase equilibrium with a saturated vapor at a first temperature. A volume of the vapor is withdrawn to a second zone. The temperature of the volume of vapor in the second zone is adjusted to a second temperature in excess of the first temperature. The volume of vapor is delivered to a third zone. A substrate is transported through the third zone. The substrate has a third temperature below the first temperature. During the transporting, a portion of the volume of vapor is condensed onto the substrate to provide a condensate. During the condensing, the temperature of the substrate is raised to substantially the first temperarature. <IMAGE>