发明名称 Process for fabricating an optical device for generating a second harmonic optical beam
摘要 <p>A method for fabricating an SHG device by forming an inversion region (4) having a first polarization selectively in a ferroelectric substrate (1) that has a second, opposite polarization. The method comprises the steps of: applying a proton exchange process for exchanging cations in the ferroelectric substrate with protons selectively in correspondence to a region in which the inversion region is to be formed; providing electrodes (5, 6) on upper and lower major surfaces of the ferroelectric substrate; and growing the inversion region selectively in a direction vertical to the upper major surface of the ferroelectric substrate while applying a d.c. voltage to the electrode on the upper major surface of the ferroelectric substrate to induce an electric field acting in a direction coincident to a direction of said first polarization in said ferroelectric substrate. <IMAGE></p>
申请公布号 EP0532969(B1) 申请公布日期 1997.12.17
申请号 EP19920114873 申请日期 1992.08.31
申请人 FUJITSU LIMITED 发明人 SAWAKI, IPPEI;KURIMURA, SUNAO;MIURA, MICHIO
分类号 G02F1/35;G02F1/355;G02F1/377;H01G7/06;H01L41/257;(IPC1-7):G02F1/05;G02F1/37;H01L41/24 主分类号 G02F1/35
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