| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive composition having improved sensitivity and capable of forming an excellent resist pattern by containing a sulfonium or iodonium salt resin having one kind of specific repeated units. SOLUTION: A sulfonium or iodonium salt resin having one kind of the repeated structural units expressed by formulas I-IV is contained in this photosensitive composition. In the formulas, R1 -R5 independently represent hydrogen atom, hydroxy group, halogen atom, alkyl group which may have substituted, cycloalkyl group, alkoxy group, or -S-R6 group, R7 and R11 represent hydrogen atom, halogen atom, cyano group, or alkyl group which may have substituted group, R8 -R10 represent hydrogen atom, hydroxy group, halogen atom, nitro group, carboxyl group, alkyl group which may have substituted group, aralkyl group, or alkoxy group, A represents -O- group or -NR12 - group, and B represents alkylene group which may have substituted group or allylene group. |
