发明名称 MANUFACTURE OF PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE MATERIAL, RELIEF PATTERN, AND POLYIMIDE PATTERN
摘要 PROBLEM TO BE SOLVED: To improve the photosensitive characteristic and storage stability by containing a specific catechol compound, a titanocene compound, and an addition polymerization compound having the specific boiling point at the normal pressure. SOLUTION: A catechol compound expressed by the formula I, a titanocene compound expressed by the formula II, and a addition polymerization compound having the boiling point of 100 deg.C or above at the normal pressure are contained. In the formulas, R<1> -R<4> represent hydrogen atom, alkyl group having 1-5 carbon atoms, phenyl group, nitro group, halogen atom, or heterocyclic ring, and R<5> -R<14> independently represent hydrogen atom, halogen atom, alkoxy group having 1-20 carbon atoms, or heterocyclic ring. 3-methyl catechol or 4-methyl catechol is used as the catechol compound, for example. Bis(cyclopentadienyl)-bis[2,6- difluoro-3-(2-(1H-pyrrole-1-yl)propyl)phenyl] titanium is used at the titanocene compound, for example.
申请公布号 JPH09325479(A) 申请公布日期 1997.12.16
申请号 JP19960138762 申请日期 1996.05.31
申请人 HITACHI CHEM CO LTD 发明人 KO MASAHIKO;KOJIMA YASUNORI;KAJI MAKOTO
分类号 G03F7/004;G03F7/008;G03F7/027;G03F7/028;G03F7/038;G03F7/30;G03F7/40;H01L21/027;H01L21/312;(IPC1-7):G03F7/028 主分类号 G03F7/004
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