发明名称 RADIATION-SENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To improve the characteristic balance such as the pattern shape, sensitivity, resolution, developing property and focus tolerance by using a copolymer containing specific repeated units, having a specific light transmission factor, and containing an alkali-soluble resin and a radiation-sensitive acied generating agent. SOLUTION: This copolymer contains a cyclic unit expressed by the formula I and a cyclic unit expressed by a formula II, it has the light transmission factor of 50% or above for the film thickness of 1μm at the wavelength of 248nm, and it contains an alkali-soluble resin and a radiation-sensitive acid generating agent. In the formulas, R<1> and R<2> represent hydrogen atom or methyl group, R<3> represents hydrogen atom, chain alkyl group having 1-10 carbon atoms, cyclic alkyl group having 3-10 carbon atoms, aryl group having 6-10 carbon atoms, or aralkyl group having 7-11 carbon atoms, and R<4> and R<5> independently represent chain alkyl group having 1-10 carbon atoms, halogenated chain alkyl group having 1-10 carbon atoms, or cyclic alkyl group having 3-10 carbon atoms.
申请公布号 JPH09325473(A) 申请公布日期 1997.12.16
申请号 JP19960159141 申请日期 1996.05.31
申请人 JAPAN SYNTHETIC RUBBER CO LTD 发明人 TANABE TAKAYOSHI;SAKURAI AKIHIKO;TSUJI AKIRA
分类号 G03F7/004;G03F7/033;G03F7/038;G03F7/039;H01L21/027;(IPC1-7):G03F7/004 主分类号 G03F7/004
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