| 摘要 |
PROBLEM TO BE SOLVED: To form a (Ba, Sr)TiO3 thin film having a high dielectric constant, by introducing stock gas, carrier gas, and reaction gas into a reaction chamber, and forming an oxide thin film on a substrate at a predetermined temperature held on a substrate holder. SOLUTION: A reaction chamber 1 is evacuated with an evacuation means 6 and is brought into a low pressure state. Then, a substrate 3 is heated with a substrate heating heater 2, and with a substrate holder 4 rotated stock gas for forming a (Ba, Sr)TiO3 thin film and oxygen are supplied into the reaction chamber 1 with a stock gas supply means 8. Plasma discharge is produced by supplying electric power to between the substrate holder 4 and an electrode 5. Hereby, there is formed on the substrate 3a (Ba, Sr)TiO3 thin film oriented preferentially along the (100) plane. A this time, the stock gas supply means 8 is brought into the state where it is inclined by a predetermined angleθwith respect to the substrate holder 4.
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