ALKALI DEVELOPMENT UNSATURATED RESIN COMPONENT AND HIGHLY SENSITIVE NEGATIVE TYPE PATTERN FORMATION MATERIAL USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide an alkali development unsaturated resin component which has wide development margin and high sensitivity and a highly sensitive negative type pattern formation material which is suitable for the application such as a material for highly brilliant color filter, an insulation film for high density integrated circuit, and a sealing material and is formed by using this resin component. SOLUTION: This component contains carboxyl group containing alternate copolymer obtained by reacting diol compound having one or more of polymerized unsaturated group in one molecule with acid dianhydride as essential acid component. Acid value of this carboxyl group containing alternate copolymer is 70 to 170mgKOH/g, and content ratio of unpolymerized acid component composed of additional product of one molecule of unreactive acid dianhydride and/or diol compound and one molecule of acid dianhydride is 20weight% or less of all acid component. Moreover, this resin component is used in a highly sensitive negative type pattern formation material for color filter or circuit insulation material.