发明名称 Silver halide photosensitive material
摘要 PCT No. PCT/JP95/00247 Sec. 371 Date Jun. 5, 1995 Sec. 102(e) Date Jun. 5, 1995 PCT Filed Feb. 21, 1995 PCT Pub. No. WO95/22786 PCT Pub. Date Aug. 24, 1995The silver halide photosensitive material of the invention comprises a support, at least one photosensitive silver halide emulsion layer provided on the support and a protective layer provided on the photosensitive silver halide emulsion layer. The protective layer contains agglomerate particles each of which is formed from plural primary particles having a particle diameter smaller than the thickness of the protective layer. For example, agglomerate particles having a mean particle diameter of 0.2 to 30 mu m composed of primary particles having a mean particle diameter of 0.01 to 10 mu m are contained in the protective layer having a thickness of 0.1 to 10 mu m. By the use of such agglomerate particles as matting agent particles, pin-holes caused by sinking of the matting agent can be inhibited and the Bekk second can be made not longer than 2,000 seconds. Moreover, this matting agent has good affinity for gelatin and is almost free from powder-dropping.
申请公布号 US5698385(A) 申请公布日期 1997.12.16
申请号 US19950446868 申请日期 1995.06.05
申请人 SOKEN CHEMICAL & ENGINEERING CO., LTD.;FUJI PHOTO FILM CO., LTD. 发明人 OUSAKA, NORIYUKI;OKADA, YASUHIRO;KANETAKE, SATOSHI;ISHIGAKI, KUNIO
分类号 G03C1/95;(IPC1-7):G03C1/32 主分类号 G03C1/95
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