发明名称 MANUFACTURE OF PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE MATERIAL, RELIEF PATTERN, AND POLYIMIDE PATTERN
摘要 PROBLEM TO BE SOLVED: To improve the photosensitive characteristic and storage stability by containing a specific benzoquinone compound, a titanocene compound, and an addition polymerization compound having the specific boiling point at the normal pressure. SOLUTION: A benzoquinone compound expressed by the formula I, a titanocene compound expressed by the formula II, and an addition polymerization compound having the boiling point of 100 deg.C or above at the normal pressure are contained. In the formulas, R<1> -R<2> independently represent hydrogen atom, alkyl group having 1-5 carbon atoms, phenyl group, nitro group, halogen atom, or heterocyclic ring, and R<3> -R<12> independently represent hydrogen atom, halogen atom, alkoxy group having 1-20 carbon atoms, or heterocyclic ring. P- benzoquinone or 2,5-methyl-p-benzoquinone is used as the benzoquinone compound. Bis(cyclopentadienyl)-bis[2,6-difluoro-3-(2-(1H-pyrrole-1-yl)propyl)ph enyl] titanium is used at the titanocene compound.
申请公布号 JPH09325481(A) 申请公布日期 1997.12.16
申请号 JP19960142777 申请日期 1996.06.05
申请人 HITACHI CHEM CO LTD 发明人 KO MASAHIKO;KOJIMA YASUNORI;KAJI MAKOTO
分类号 G03F7/004;G03F7/008;G03F7/027;G03F7/028;G03F7/038;G03F7/30;G03F7/40;H01L21/027;H01L21/312;(IPC1-7):G03F7/028 主分类号 G03F7/004
代理机构 代理人
主权项
地址