| 摘要 |
PROBLEM TO BE SOLVED: To provide a wafer transfer device for an electron beam lithography system which is highly reliable and enables a wafer to be transferred at a fast speed. SOLUTION: A transfer arm 11 unloads a cassette from a wafer cassette 9, carries it to a rotary stand 12 and alignment is performed here. Thereafter, the arm 11 transfers the wafer to a sample exchange chamber 1 and the wafer is transferred to a sample stage 14 by an arm 2 and pattern generation is carried out. Meanwhile, a wafer after pattern generation is carried to a sample exchange chamber 5 by an arm 6 and is further transferred to a wafer cassette 9 by a carrier arm 11 and is stored. Carrying-out of a wafer after pattern generation from a sample stage and carrying-in of a new wafer to a sample stage are performed parallelly. |
