发明名称 VACUUM TREATING APPARATUS
摘要 PROBLEM TO BE SOLVED: To facilitate adding, changing and expanding of a vacuum treating chamber with reduced space by placing a first treating chamber at nearer position to an entrance/ejection chamber than a second treating chamber to suppress the lateral size increase in plan layout. SOLUTION: Two second large-outer diameter treating chambers 36A, 36C are parallel disposed at the far side of a load lock chamber 34 and longitudinally to a vacuum conveying chamber 37. Two first smaller-outer diameter treating chambers 36B, 36D are disposed approximately at both sides of the chamber 37 at the near side of the load lock chamber 34. This suppresses the lateral size increase in plan layout and length increase of a vacuum treating apparatus 300 away from the load lock chamber 34, thereby saving the entire space. This also minimizes the sample conveying length of a pneumatic conveying means, improves the throughput with adapting to large apertures of samples and suppresses the production cost rise.
申请公布号 JPH09321117(A) 申请公布日期 1997.12.12
申请号 JP19960134938 申请日期 1996.05.29
申请人 HITACHI LTD 发明人 SORAOKA MINORU;YOSHIOKA TAKESHI;KAWASAKI YOSHINAO
分类号 H01L21/302;H01L21/02;H01L21/203;H01L21/205;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/302
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