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发明名称
Verfahren zum Aufbringen einer Metall- oder Passivierenschicht mit hoher Haftung über einem isolierten Halbleitersubstrat
摘要
申请公布号
DE69219529(T2)
申请公布日期
1997.12.11
申请号
DE19926019529T
申请日期
1992.08.05
申请人
NEC CORP., TOKIO/TOKYO, JP
发明人
OKABAYASHI, HIDEKAZU, MINATO-KU, TOKYO., JP;ENDO, SHOICHI, KYOTO-SHI, KYOTO, JP
分类号
H01L21/3205;H01L21/321;H01L21/768;(IPC1-7):H01L21/768
主分类号
H01L21/3205
代理机构
代理人
主权项
地址
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