发明名称 X-RAY ANALYZING METHOD AND APPARATUS THEREFOR
摘要 <p>PROBLEM TO BE SOLVED: To enable detailed analysis by fixing the incident angle of monochromatic primary X-rays to the surface of a sample and analyzing the sample on the basis of the change of the intensity of fluorescent X-rays detected by changing the taking-out angle of fluorescent X-rays from the surface of the sample. SOLUTION: At first, the incident angleθc of monochromatic primary X-rays 24 is fixed to a desired angle to allow X-rays 24 to be incident on the surface 1a of a sample and the change of the intensity of fluorescent X-rays 25 generated near the surface 1a of the sample is measured by a detector 13 while the taking-out angleθthereof is changed. A part of fluorescent X-rays 25 generated from the vicinity of the surface 1a of the sample when the sample 1 is irradiated with primary X-rays 24 goes toward the outside directly and the intensity thereof is isotoropic but the other part of them is refracted by the surface 1a of the sample to issue and the intensity thereof has the max. value at the critical angle inherent to the constituent element in the vicinity of the surface 1a of the sample. Therefore, the change of the intensity of fluorescent X-rays 25 wherein both intensities are combined is measured and the taking-out angle taking the max. value in intensity is compared with known data to analyze the constituent element near the surface 1a of the sample or the oxidation state thereof in detail.</p>
申请公布号 JPH09318565(A) 申请公布日期 1997.12.12
申请号 JP19960153160 申请日期 1996.05.24
申请人 RIGAKU IND CO 发明人 UKO TADASHI;YAMADA TAKASHI
分类号 G01N23/223;G21K1/06;(IPC1-7):G01N23/223 主分类号 G01N23/223
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