Lichtempfindlicher, wäßrig-alkalisch entwickelbarer, negativ arbeitender Resist

摘要

The invention concerns a light-sensitive resist which can be developed in an aqueous-alkali manner, operates negatively and is used to produce negative structures in the m and nm ranges. The resist comprises as light-sensitive component a diazidostilbene-disulphonic acid ester of general formula (I) in which R<1> designates a group of formula (II) in which R<2>, n and X have the meanings given in the application. In the spectral range of between 200 and 400 nm the resist displays great sensitivity and exceptional solubility in the solvent used. The diazidostilbene-disulphonic acid esters of formula (I) are economical and can be prepared in a simple two-step synthesis.