发明名称 |
Fluoride additive containing chemical mechanical polishing slurry and method for use of same |
摘要 |
<p>A chemical mechanical polishing slurry having a pH in the range 1.5 to 3.0 comprising an oxidizing agent such as ferric nitrate, a fluoride containing additive such as hydrofluoric acid in an amount ranging from 0.01 to 0.3 weight percent and an abrasive consisting of fine metal particles, such as fumed alumina and a method for using the fluoride containing additive chemical mechanical polishing slurry to remove tungsten and titanium from substrates.</p> |
申请公布号 |
EP0811666(A2) |
申请公布日期 |
1997.12.10 |
申请号 |
EP19970303836 |
申请日期 |
1997.06.04 |
申请人 |
CABOT CORPORATION |
发明人 |
STREINZ, CHRISTOPHER C.;MUELLER, BRIAN L.;LUCARELLI, MICHAEL A.;WALTERS, MAX H. |
分类号 |
B24B37/00;C09G1/02;C09K3/14;C09K13/04;H01L21/304;H01L21/321;H01L21/3213;(IPC1-7):C09G1/02 |
主分类号 |
B24B37/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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