发明名称 |
Liquid crystal display device and process for production thereof |
摘要 |
<p>A process of producing a semiconductor substrate for a liquid crystal display device which comprises: a display portion (8) having a plurality of pixels and a thin film transistor comprising respective non-monocrystalline semiconductor active region connected to each said pixel; a peripheral circuit driving portion (A) comprising a monocrystalline semiconductor region for receiving image input signals and driving said display portion, wherein said display portion and said peripheral circuit driving portion are monolithically formed; a first oxide film (3) under said non-monocrystalline semiconductor region (8); and a second oxide film (19) which is formed in said peripheral circuit driving portion (A) and isolates an element constituting said peripheral circuit driving portion: which process is characterised in that first (3) and second oxide film (19) are formed in separate steps, and in that the second oxide film (19) is formed thinner than the first oxide film (3). <IMAGE></p> |
申请公布号 |
EP0811869(A1) |
申请公布日期 |
1997.12.10 |
申请号 |
EP19970303780 |
申请日期 |
1997.06.03 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
ICHIKAWA, TAKESHI;OKITA, AKIRA |
分类号 |
G02F1/136;G02F1/1362;G02F1/1368;H01L21/336;H01L29/786;(IPC1-7):G02F1/136 |
主分类号 |
G02F1/136 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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