| 摘要 |
A fabrication method of contact holes having fine patterns is disclosed. The method comprises the steps of: coating a positive PR layer(23) on an insulating layer(21); firstly exposing the positive PR layer(23) to form a first exposing region(25) and secondly exposing the positive PR layer(23) to form a second exposing region(26); thirdly exposing the PR layer(23) to form a third exposing region(27); fourth exposing the PR layer to form a fourth exposing region(28); developing the exposing regions(25,26,27,28) to form a PR pattern(23); and forming a fine contact hole(29) by etching the exposed insulating layer(21) using the PR pattern(23) as a mask. Thereby, it is possible to easily form contact holes having fine patterns.
|
