发明名称 PERMANENT MAGNET FOR ULTRAHIGH VACUUM APPLICATION AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>In order to provide a permanent magnet useful in the ultra-high vacuum atmosphere, which said permanent magnet is applicable to the undulator requiring the ultra-high vacuum atmosphere less than 1 x 10<-9>Pa, has excellent magnetic characteristics, and is coated with dense and adherent film(s) to prevent the gas generation or exhaustion therefrom; the surface of the R-Fe-B system permanent magnet was coated with the film(s) by following sequential procedures; namely, (1) cleaning the surface area of the magnet by the ion sputter method, (2) forming Ti under coated film by the thin film forming technique such as an ion plating method, (3) by the thin film forming technique such as the ion plating method under a mixed gas of Ar gas and nitrogen gas, forming the nitrogen diffused layer (TiNx, x=0 SIMILAR 1) with gradually increasing N concentration toward to Ti coated layer, or forming Al coated film onto Ti coated layer by the ion plating method, or forming AlN film on said Al coated layer by the ion reaction technique under the N2 gas atmosphere, or forming a complex compound Ti1-xAlxN onto the Al coated layer through the ion reaction plating method in the N2 containing gaseous atmosphere. <IMAGE></p>
申请公布号 EP0811994(A1) 申请公布日期 1997.12.10
申请号 EP19960942585 申请日期 1996.12.20
申请人 SUMITOMO SPECIAL METALS COMPANY LIMITED 发明人 KIKUI, FUMIAKI;IKEGAMI, MASAKO;YOSIMURA, KOHSHI
分类号 H01F41/02;H05H7/04;(IPC1-7):H01F1/04 主分类号 H01F41/02
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