| 摘要 |
A method for forming, and an arrangement for using arbitrary angle mirrors in substrates is disclosed. An erodible material, such as a photoresist, is applied to a substrate at a site and is exposed to radiation at that site which has a linear variation in energy at the surface of the erodible material. Due to this variation in exposure energy, a taper results in the erodible material after development. The tapered region is then etched in a manner which etches both the erodible layer and the underlying substrate. The taper in the erodible layer provides a varying attenuation during the etching process such that the taper of the erodible layer, or a multiple of it, is transferred to the substrate. In a first embodiment, a tapered reflective surface is formed in a substrate, which surface engages an optical signal and deflects it to an optical device or another surface. In a second embodiment, two tapered reflective surfaces are formed in a substrate and oriented to deflect incident light to a modulation device. In a third embodiment, an arrangement for modulating a light signal is formed by two tapered reflective surfaces. The surfaces are oriented to form a vee groove in a substrate and are coated with an active semiconductor device. <IMAGE> |
