发明名称 Process for developing irradiated radiation-sensitive recording materials
摘要 A process for developing irradiated radiation-sensitive recording materials using an aqueous-alkaline developer which contains compounds of the formula (I) <IMAGE> (I) wherein A is H, Na, K, NH4 or NR4, where R is a substituted or unsubstituted alkyl radical, W and X, independently of one another are H or -CH2-COOA, Y is H or COOA and Z is H or OH, wherein the compound of the formula (I) contains at least 3 COOA units.
申请公布号 US5695903(A) 申请公布日期 1997.12.09
申请号 US19950575903 申请日期 1995.12.20
申请人 AGFA-GEVAERT AG 发明人 ELSAESSER, ANDREAS;FRASS, WERNER;BACHSTEIN, JUTTA
分类号 G03F7/00;G03F7/30;G03F7/32;G03G13/28;(IPC1-7):G03F7/32 主分类号 G03F7/00
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