摘要 |
A process for developing irradiated radiation-sensitive recording materials using an aqueous-alkaline developer which contains compounds of the formula (I) <IMAGE> (I) wherein A is H, Na, K, NH4 or NR4, where R is a substituted or unsubstituted alkyl radical, W and X, independently of one another are H or -CH2-COOA, Y is H or COOA and Z is H or OH, wherein the compound of the formula (I) contains at least 3 COOA units.
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