发明名称 METHOD FOR REMOVING PELLICLE FROM PHOTOMASK
摘要 <p>PROBLEM TO BE SOLVED: To easily remove a pellicle stuck to a photomask without damaging or soiling the photomask. SOLUTION: The pellicle 1 is constituted by spreadingly providing a pellicle film 3 at one end face of a pellicle frame 2 and forming an adhesive agent layer 4 at the other end face thereof. At the time of removing the pellicle 1 stuck to the photomask 5 via the adhesive agent layer 4 from the photomask 5, a tongue piece 7 made of resin or rubber which is capable of adhering to the adhesive agent layer 4 is adhered to an outer side of the adhesive agent layer 4. By pulling the tongue piece 7 outside, the adhesive agent layer 4 is stripped from the pellicle frame 2 and from the photomask 5 and is extracted from between them.</p>
申请公布号 JPH09311435(A) 申请公布日期 1997.12.02
申请号 JP19960146614 申请日期 1996.05.16
申请人 SHIN ETSU CHEM CO LTD 发明人 KASHIDA SHU
分类号 G03F1/62;H01L21/027;(IPC1-7):G03F1/14 主分类号 G03F1/62
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