发明名称 |
SEMICONDUCTOR DEVICE AND MANUFACTURE THEREOF |
摘要 |
PROBLEM TO BE SOLVED: To obtain a stable high-reliability capacitor by heat treating a dielectric film between a first and a second electrodes made of a conductive film and dielectric film having an electric flux density-electrolytic strength characteristic showing a hysteresis into a film involving a reformed film having no hysteresis. SOLUTION: 1) A Pt film is formed on a Si substrate 302 by the DC sputtering to form lower electrodes 302. 2) A material soln. is spin-coated on the whole surface by the sol-gel method to form an amorphous film 401 having a ferroelectric compsn. 3) It is dried to remove the solvent from this film 401 and the film 401 is rapidly heated to crystallize it to form a PZT film 403. 4) After forming a Pt film, upper electrodes 501 are formed and this film 403 is reformed in a N atmosphere by a second heat treatment to form a reformed PZT film 601. This eliminates the operation instability of a capacitor due to the ferroelectric property to thereby reduce the leak current. |
申请公布号 |
JPH09312381(A) |
申请公布日期 |
1997.12.02 |
申请号 |
JP19960128571 |
申请日期 |
1996.05.23 |
申请人 |
HITACHI LTD |
发明人 |
MIKI HIROSHI;TORII KAZUNARI;FUJISAKI YOSHIHISA |
分类号 |
H01L27/04;H01L21/314;H01L21/822;H01L21/8242;H01L27/108 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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