发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURE THEREOF
摘要 PROBLEM TO BE SOLVED: To obtain a stable high-reliability capacitor by heat treating a dielectric film between a first and a second electrodes made of a conductive film and dielectric film having an electric flux density-electrolytic strength characteristic showing a hysteresis into a film involving a reformed film having no hysteresis. SOLUTION: 1) A Pt film is formed on a Si substrate 302 by the DC sputtering to form lower electrodes 302. 2) A material soln. is spin-coated on the whole surface by the sol-gel method to form an amorphous film 401 having a ferroelectric compsn. 3) It is dried to remove the solvent from this film 401 and the film 401 is rapidly heated to crystallize it to form a PZT film 403. 4) After forming a Pt film, upper electrodes 501 are formed and this film 403 is reformed in a N atmosphere by a second heat treatment to form a reformed PZT film 601. This eliminates the operation instability of a capacitor due to the ferroelectric property to thereby reduce the leak current.
申请公布号 JPH09312381(A) 申请公布日期 1997.12.02
申请号 JP19960128571 申请日期 1996.05.23
申请人 HITACHI LTD 发明人 MIKI HIROSHI;TORII KAZUNARI;FUJISAKI YOSHIHISA
分类号 H01L27/04;H01L21/314;H01L21/822;H01L21/8242;H01L27/108 主分类号 H01L27/04
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