发明名称 PHOTOSENSITIVE MATERIAL FOR EXPOSURE TO LASER BEAMS
摘要 PROBLEM TO BE SOLVED: To facilitate image appreciation and to prevent occurrence of interference fringes on an image by specifying the absorbance range of a support in an exposure wavelength and an average silver halide size range in a photosensitive silver halide emulsion layer formed ion the support. SOLUTION: The support of the photosensitive material to be exposed to laser beams has an absorbance of >=0.3 in the exposure wavelength and that of <=0.2 in the wavelength of 500nm, and the photosensitive silver halide emulsion layer formed on the support has an average grain size of 0.01-0.4μm, thus permitting the photosensitive material for laser beams to be good in the transparence of the support and to be facilitated in image appreciation and to prevent occurrence of interference fringes. When the absorbance of the support in the exposure wavelength is less than 0.3, the interference fringes occur and when the absorbance at 500nm exceeds 0.2, the transparence of the support becomes insufficient.
申请公布号 JPH09311393(A) 申请公布日期 1997.12.02
申请号 JP19960151539 申请日期 1996.05.23
申请人 FUJI PHOTO FILM CO LTD 发明人 TOTANI ICHIZO;HARADA TORU
分类号 G03C1/00;G03C1/035;G03C1/498;G03C1/74;G03C5/08;(IPC1-7):G03C1/00 主分类号 G03C1/00
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