发明名称 ELECTRODE MATERIAL FOR COMPOUND SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To provide an electrode material which is doped with p-type impurity and obtains good ohmic contact for a III-V compound semiconductor, and an electrode using this material, thus enabling reduction in driving voltage of a device using this compound semiconductor. SOLUTION: [1] This material is expressed by a general formula, Inx Gay Alz N (where x+y+z=1, 0<=x<=1, 0<=y<=1, 0<=z<=1), doped with p-type impurity for a III-V compound semiconductor. In this case, this material is metal containing at least Ca and a precious metal, and the total weight of Ca and the precious metal is not less than 50% and not more than 100% of the weight of the whole electrode material. [2] Also, an electrode using this material is expressed by a general formula, Inx Gay Alz N (where x+y+z=1, 0<=x<=1, 0<=y<=1, 0<=z<=1), doped with p-type impurity for a III-V compound semiconductor. In this case, this electrode is formed on the compound semiconductor, by using the electrode material of [1].
申请公布号 JPH09312273(A) 申请公布日期 1997.12.02
申请号 JP19960128299 申请日期 1996.05.23
申请人 SUMITOMO CHEM CO LTD 发明人 IECHIKA YASUSHI;ONO YOSHINOBU;TAKADA TOMOYUKI;INUI KATSUMI
分类号 H01L21/285;H01B1/16;H01L21/28;H01L29/45;H01L33/32;H01L33/40;H01S5/00;H01S5/042;H01S5/323 主分类号 H01L21/285
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