发明名称 |
Positive chemically amplified resist composition |
摘要 |
A positive chemically amplified resist composition is disclosed, comprising (a) a compound which generates an acid upon irradiation with active light or radiant ray; (b) a resin insoluble in water but soluble in an aqueous alkali solution; and (c) a low molecular acid-decomposable dissolution inhibitor having a molecular weight of 3,000 or less and containing an acid-decomposable alkyl ester group represented by formula (I), and which increases its solubility in an alkali developer by the action of an acid, and having a sodium content and a potassium content each of 30 ppb or less. Also disclosed is a positive chemically amplified resist composition comprising the foregoing compound (a) and (d) a resin having an acid-decomposable alkyl ester group represented by formula (I), and which increases its solubility in an alkali developer by the action of an acid, and having a sodium content and a potassium content each of 30 ppb or less. Still further disclosed are methods for producing the compounds (c) and (d).
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申请公布号 |
US5693452(A) |
申请公布日期 |
1997.12.02 |
申请号 |
US19950548721 |
申请日期 |
1995.10.26 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
AOAI, TOSHIAKI;FUJIMORI, TORU |
分类号 |
G03F7/039;C08F8/02;C08L61/04;C08L61/06;G03F7/004;H01L21/027;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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