发明名称 |
DC magnetron sputtering method and apparatus |
摘要 |
A method of producing a magnetic recording medium by sputtering a layer onto a substrate by DC-magnetron sputtering from a target while exposing the target to an RF signal is described. The RF signal is effective to extend the target utilization without significantly decreasing the sputtering rate. Also disclosed is an apparatus for use forming a medium in accordance with the method of the invention.
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申请公布号 |
US5693197(A) |
申请公布日期 |
1997.12.02 |
申请号 |
US19940319862 |
申请日期 |
1994.10.06 |
申请人 |
HMT TECHNOLOGY CORPORATION |
发明人 |
LAL, BRIJ BIHARI;BOUREZ, ALLEN J.;SHINOHARA, TADASHI |
分类号 |
C23C14/35;G11B5/851;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/35 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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