发明名称 DC magnetron sputtering method and apparatus
摘要 A method of producing a magnetic recording medium by sputtering a layer onto a substrate by DC-magnetron sputtering from a target while exposing the target to an RF signal is described. The RF signal is effective to extend the target utilization without significantly decreasing the sputtering rate. Also disclosed is an apparatus for use forming a medium in accordance with the method of the invention.
申请公布号 US5693197(A) 申请公布日期 1997.12.02
申请号 US19940319862 申请日期 1994.10.06
申请人 HMT TECHNOLOGY CORPORATION 发明人 LAL, BRIJ BIHARI;BOUREZ, ALLEN J.;SHINOHARA, TADASHI
分类号 C23C14/35;G11B5/851;(IPC1-7):C23C14/34 主分类号 C23C14/35
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