发明名称 |
Polishing slurries comprising two abrasive components and methods for their use |
摘要 |
An aqueous slurry is provided for polishing or planarizing a work piece which contains a metal, the solids portion of said slurry being comprised of 1 to 50 percent by weight of submicron alpha-alumina, the remainder of the solids being of a substantially less abrasive composition chosen from the group consisting of aluminum hydroxides, gamma-alumina, delta-alumina, amorphous alumina, and amorphous silica. Also provided is a method for polishing the surface of a work piece which contains a metal wherein said aqueous slurry is used as the polishing composition during chemical-mechanical polishing.
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申请公布号 |
US5693239(A) |
申请公布日期 |
1997.12.02 |
申请号 |
US19950541898 |
申请日期 |
1995.10.10 |
申请人 |
RODEL, INC. |
发明人 |
WANG, JIUN-FANG;SETHURAMAN, ANANTHA;WANG, HUEY-MING;COOK, LEE MELBOURNE |
分类号 |
B24B37/00;C09G1/02;C09K3/14;C23F1/00;C23F3/00;H01L21/304;(IPC1-7):C23F1/00;C23F1/44 |
主分类号 |
B24B37/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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