| 摘要 |
PROBLEM TO BE SOLVED: To obtain a general-purpose resist removing agent capable of surely removing even a photoresist whose removability has been reduced through a dry etching process or an ion implanting process, having low toxicity and no corrosiveness and emitting little odor by incorporating a specified imidazoline deriv. SOLUTION: This resist removing agent contains 1,3-dimethyl-2- imidazolidinone represented by the formula as an effective component. Since the compd. has low toxicity and emits little odor, it is easily handled. This resist removing agent is a general-purpose resist removing agent capable of surely removing even a photoresist whose removability has been reduced through a dry etching process or an ion implanting process, having low toxicity and no corrosiveness and emitting little odor. |
