发明名称 INFRARED RAY DETECTING EQUIPMENT AND ITS MANUFACTURE
摘要 PROBLEM TO BE SOLVED: To reduce penetrating dislocation density generated in an HgCdTe photoelectric conversion layer which is grown on a dissimilar substrate such as a silicon substrate. SOLUTION: In this infrared ray detecting equipment, a CdTe intermediate layer 2, an HgTe very thin layer 3, an HgCdTe dislocation relieving layer 4 and an HgCdTe photoelectric conversion layer 5 are laminated in order on a substrate 1 composed of one out of silicon, GaAs, GaAs/silicon, and sapphire. Cd composition of the HgCdTe dislocation relieving layer 4 is set in the middle of Cd compositions of the CdTe middle layer 2 and the HgCdTe photoelectric conversion layer 5. The inclinationθfrom 111} face of the respective layers 2-5 is set as 0 deg.<=θ<=6 deg..
申请公布号 JPH09307124(A) 申请公布日期 1997.11.28
申请号 JP19960121350 申请日期 1996.05.16
申请人 FUJITSU LTD 发明人 NISHINO HIROSHI;OKAMOTO TORU
分类号 G01J1/02;G01J5/02;G01J5/34;H01L31/0264;(IPC1-7):H01L31/026 主分类号 G01J1/02
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