发明名称 INFRARED DETECTING DEVICE AND MANUFACTURE THEREOF
摘要 PROBLEM TO BE SOLVED: To make it possible to obtain normal infrared spectral characteristics and a full photocurrent by a method wherein the degree of the composition gradient in the thickness direction of a specified epitaxially grown layer is made so high that an electric field due to a difference between the forbidden band widths of the layer, which are generated by the composition gradient, works dominantly rather than diffusion to a minority carrier transfer. SOLUTION: A composition gradient depends upon a growth starting temperature and a cooling-down rate and in the case where the cooling-down rate is 0.05 deg.C/minute, the growth starting temperature is set at 467 deg.C or lower. In the case where the growth starting temperature is high, the cooling-down rate is set at 0.13 deg.C/minute or higher. By making lower the temperature and by increasing higher the rate an Hg1-x Cdx Te liquid phase epitaxially grown layer 2 having a larger composition gradient is obtained. The degree of the composition gradient in the thickness direction of the layer 2 is set as a magnitude, in which an electric field due to a difference between the forbidden band widths of the layer 2, which are generated by the composition gradient, works dominantly rather than diffusion to a minority carrier transfer. For example, the magnitude is set in 0.0027μm<-1> or higher, to detect normal infrared spectral characteristics and a full photocurrent from an infrared detecting device.
申请公布号 JPH09307123(A) 申请公布日期 1997.11.28
申请号 JP19960121349 申请日期 1996.05.16
申请人 FUJITSU LTD 发明人 OZAKI KAZUO;YAMAMOTO KOSAKU
分类号 H01L27/14;H01L21/368;H01L31/0264;(IPC1-7):H01L31/026 主分类号 H01L27/14
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