| 摘要 |
<p>PROBLEM TO BE SOLVED: To prevent a display defect due to shot unevenness caused by alignment deviation at every shot and to improve display quality in a large-sized array substrate having a TFT(thin film transistor) exposed at every shot by a stepper system exposure device to be formed. SOLUTION: An opening 41 is formed in a display pixel electrode 36 on a accumulable capacity electrode 40, and an auxiliary capacity adjusting electrode 42 being the same layer as a source electrode 37 and forming adjusting accumulable capacity between with the accumulable capacity electrode is provided on the opening 41, and the accumulable capacity is increased/decreased corresponding to the increase/decrease of the capacity between a gate electrode and a source electrode due to the alignment deviation. Thus, fluctuation in a deviation amount when a gate voltage is switched is suppressed, and the shot unevenness is suppressed.</p> |
