| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin compound which can form a tough relief pattern which does not leave development and high precision by development easily. SOLUTION: This compound contains repetitive unit shown by the following formula, and contains 100 weight parts of resin compound of which polystyrene conversion molecular weight is 1,000 to 1,000,000 and 1 to 100 weight parts of optical acid generating agent which generates acid due to irradiation of electromagnetic waves. In the formula, A<1> is selected from among quadrivalent aromatic group having the number of carbons of 4 or more, aliphatic hydrocarbon, and cyclic hydrocarbon, and R<1> and R<2> are selected from saturated aliphatic carboxylic acid group having the number of carbons of 20 or less, and they may be the same each other. |
