| 摘要 |
PROBLEM TO BE SOLVED: To accurately inspect whether a shift pattern part is formed according to a desired shape with respect to a mask. SOLUTION: A Levenson mask 10 is irradiated with light from a light source 13 and the light passed through the mask 10 is detected by photoelectric converter elements 171 to be photoelectrically converted to be compared with a reference signal based on plan data to inspect the pattern flaw of the mask 10. At this time, a step inserting a polarizer 15 between the light source 13 and the mask 10 and arranging liquid crystal cells 172 each having the same size as a pixel on the light detection surface of respective pixels of the photoelectric converter elements 171 detecting the light passed through the mask 10, a step irradiating the polarizer 15 with the light from the light source 13, a step controlling the polarizing angle of the liquid crystal cells so that light passing quantity becomes max. or min and a step judging whether a pattern flaw is present on the basis of the photoelectric conversion output level of the photoelectric converter elements 171 are provided. |
