发明名称 HOT ULTRA-PURE WATER DEWAXING PROCESS
摘要 A process for removing waxes from polished single crystal semiconductor wafers is disclosed. The process uses heated recirculated ultra-pure water for wax liquefaction, and therefore eliminates methylene chloride from the process. An apparatus utilized to carry out the process of the present invention is also disclosed.
申请公布号 WO9744817(A1) 申请公布日期 1997.11.27
申请号 WO1997US09049 申请日期 1997.05.22
申请人 SEH AMERICA, INC. 发明人 HARRIS, JAY, WAYNE
分类号 H01L21/00;(IPC1-7):H01L21/00 主分类号 H01L21/00
代理机构 代理人
主权项
地址