发明名称 Air-supply hood system for photolithography in semiconductor manufacture
摘要 The system includes an air supply hood (2) on the periphery of a reduction projection lens (1) which is divided into several sections by several air baffles (3), while several air supply lines (4) supply air of preset temperature to each section of the hood. Preferably the air baffles are distributed along the periphery of the reduction lens. The temperature of air supplied to each section of the hood is different. Alternatively the supply air temperature may be the same. Typically the air supply hood is in the form of a hollow cylinder.
申请公布号 DE19703969(A1) 申请公布日期 1997.11.27
申请号 DE19971003969 申请日期 1997.02.03
申请人 LG SEMICON CO., LTD., CHEONGJU, KR 发明人 KIM, KWANG CHUL, KUMI, KR
分类号 G03F7/20;H01L21/027;(IPC1-7):G03F7/20;H01L21/02 主分类号 G03F7/20
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