PHOTOSENSITIVE SOLUTIONS AND USE THEREOF IN MAKING THIN FILMS

摘要

A photosensitive liquid solution (106) is used to make thin films for use in integrated circuits. The photosensitive liquid solution contains a photo initiator, and solvent, and a mixture of metals bonded to free-radical-susceptible monomers. The metals are mixed in amounts corresponding to the desired stoichiometry of a metal oxide thin film that derives from the solution. The photosensitive liquid solution is applied (P206) to a substrate (100), soft baked (P208), and exposed (P210) to ultraviolet radiation (116) under a photo mask (112). The ultraviolet radiation patterns the soft-baked film through a free radical polymerization chain reaction. A solvent etch (P212) is used to remove the unpolymerized portion of the polymerized film. The remaining thin film pattern is annealed to provide a patterned metal oxide film.