发明名称 Sidewall strap
摘要 The present invention is a sidewall connector providing a conductive path linking at least two conductive regions. The sidewall connector has a top portion comprising surface. A conductive member contacts the top portion, connecting the rail to a conductive region or to an external conductor. An etch stop layer located on a conductive region can be used to protect the conductive region during the directional etch to form the sidewall connector. A conductive bridge is then used to link exposed portions of the conductive region and the conductive sidewall rail, the conductive bridge extending across the thickness of the etch stop layer. A "T" connector is formed by the process, starting with a pair of intersecting sidewalls wherein the two sidewalls have top edges at different heights where they intersect. The connector is used to form a strap for a DRAM cell.
申请公布号 US5691549(A) 申请公布日期 1997.11.25
申请号 US19960720991 申请日期 1996.10.15
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 LAM, CHUNG HON;NAKOS, JAMES S.;KENNEY, DONALD MCALPINE;ADLER, ERIC
分类号 H01L21/768;H01L21/8242;H01L23/485;(IPC1-7):H01L29/80;H01L31/112 主分类号 H01L21/768
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