发明名称 |
Sidewall strap |
摘要 |
The present invention is a sidewall connector providing a conductive path linking at least two conductive regions. The sidewall connector has a top portion comprising surface. A conductive member contacts the top portion, connecting the rail to a conductive region or to an external conductor. An etch stop layer located on a conductive region can be used to protect the conductive region during the directional etch to form the sidewall connector. A conductive bridge is then used to link exposed portions of the conductive region and the conductive sidewall rail, the conductive bridge extending across the thickness of the etch stop layer. A "T" connector is formed by the process, starting with a pair of intersecting sidewalls wherein the two sidewalls have top edges at different heights where they intersect. The connector is used to form a strap for a DRAM cell.
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申请公布号 |
US5691549(A) |
申请公布日期 |
1997.11.25 |
申请号 |
US19960720991 |
申请日期 |
1996.10.15 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
LAM, CHUNG HON;NAKOS, JAMES S.;KENNEY, DONALD MCALPINE;ADLER, ERIC |
分类号 |
H01L21/768;H01L21/8242;H01L23/485;(IPC1-7):H01L29/80;H01L31/112 |
主分类号 |
H01L21/768 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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