| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a fluid control device optimal for securing the purity of the fluid, of which purity should be secured at a high level, such as the process gas and for reducing the used variable thereof by using a relatively long passage as an auxiliary passage for flowing the fluid, of which purity should be secured at a high level. SOLUTION: A fluid control device is provided with a relatively long auxiliary passage 18, which is formed of a flow-out passage 12 of an upper valve main body 4 and a bypass passage 15 of a lower valve main body 5, and a relatively short auxiliary passage 17, which is formed of a part of a flow-out passage 14 of the lower valve main body 5. A process gas A is flowed to the relatively long auxiliary passage 18, and a purge gas B is flowed to the relatively short passage 17. Consequently, when the fluid, of which purity should be secured at a high degree, is flowed, the fluid is accumulated in the only relatively short auxiliary passage 17. On the other hand, in the case where the short auxiliary passage 17 is used as the auxiliary passage for the fluid, of which purity should be secured at a high degree, the fluid is accumulated in the relatively long auxiliary passage 18 when the fluid, of which purity should be secured at a high degree, is flowed.</p> |
