发明名称 Method of producing a high Tc superconducting film free of second phase defects
摘要 A thin film which is substantially free of measurable surface defects due to second-phase inclusions is disclosed. The film is composed of multilayered strata of a first metal oxide interspersed with single molecular layers of a second metal oxide, where the second metal oxide is effective to absorb second-phase defects which form in the first oxide layers.
申请公布号 US5691280(A) 申请公布日期 1997.11.25
申请号 US19960648780 申请日期 1996.05.14
申请人 VARIAN ASSOCIATES, INC. 发明人 ECKSTEIN, JAMES N.;BOZOVIC, IVAN
分类号 H01L39/12;H01L39/24;(IPC1-7):H01L39/24 主分类号 H01L39/12
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