| 摘要 |
A device for manipulating a synchrotron beam bundle is intended to produce properties of the beam bundle, under vacuum conditions, which are adapted to the respective application of deep X-ray lithography, in particular, which are adapted to the scanning regimen. Pairs of diaphragms which are displaceable relative to one another are provided between the object table and an inlet window within a vacuum chamber containing an object table for receiving an object to be irradiated, which object table is adjustable by a scanning movement relative to the synchrotron beam bundle. The pair of diaphragms for which the direction of relative displacement of the diaphragms coincides with the scanning movement is coupled with the scanning movement. Further, a filter chamber is arranged upstream of the vacuum chamber and contains filters which can be inserted into the synchrotron beam bundle. The device is for use in irradiating equipment for deep X-ray lithography which are used to fabricate microsystems components by means of a technique known as the LIGA process (lithography with synchrotron radiation, electroforming and plastics molding). |
